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Micromirror Technology for Maskless Lithography by Yijian Chen (Paperback, 2013)
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About this product
Product Information
This book presents a complete analysis and review of dynamics, control and fabrication of MEMS micromirrors for applications in DUV and EUV maskless lithography. The transient and resonant behavior of various types of electro-mechanically damped micromirrors with various degrees of freedom are discussed. The theoretical approach using the perturbation method and linear control theory is described. Micromirror design and fabrication issues including the material properties, process integration, and device reliability are addressed. Novel processing solutions such as the self-aligned spacer patterning technique to define nano-scale actuation gaps for low-voltage operation are introduced. Fabrication results of highly complicated 3-D MEMS devices such as vertical-comb tilting micromirrors and double-flexure piston micromirrors are demonstrated. This book serves as an excellent in-depth source of MEMS dynamics, control, and fabrication knowledge for both graduate students and experienced researchers.Product Identifiers
PublisherScholars' Press
ISBN-139783639513653
eBay Product ID (ePID)188909571
Product Key Features
SubjectEngineering & Technology
Publication Year2013
Number of Pages156 Pages
Publication NameMicromirror Technology for Maskless Lithography
LanguageEnglish
TypeTextbook
AuthorYijian Chen
FormatPaperback
Dimensions
Item Height229 mm
Item Weight236 g
Item Width152 mm
Additional Product Features
Title_AuthorYijian Chen
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