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Chemical Vapor Deposition by Pradeep George (Paperback, 2008)

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Product Information

The deposition of thin films on to a solid substrate has become an important materials processing technique and is of interest in many applications such as those involved with the fabrication of micro-electronic circuits, optical and magnetic devices, etc. Thin films are generally deposited by the process of Chemical Vapor Deposition (CVD).This work is directed at the simulation and optimization of the CVD process in a vertical impinging CVD reactor for material fabrication, focusing on the rate of deposition and on the uniformity of the thin film obtained. This work considers the deposition of Silicon from Silane. Numerical simulations are used to determine the effect of important design variables on the deposition rate and film characteristics. Then Response surfaces are created using the Compromise Response Surface Method (CRSM) to approximate the responses for the range of design variables considered. Then stochastic optimization is performed using the Mean Value Method (MVM) on the resulting response surfaces to find the optimal values of the design variables for various levels of uncertainty.

Product Identifiers

PublisherVdm Verlag Dr. Mueller E.K.

ISBN-139783836496841

eBay Product ID (ePID)5049043206

Product Key Features

Number of Pages112 Pages

Publication NameChemical Vapor Deposition

LanguageEnglish

Publication Year2008

TypeTextbook

Subject AreaChemical Engineering

AuthorPradeep George

FormatPaperback

Dimensions

Item Height229 mm

Item Weight159 g

Item Width152 mm

Additional Product Features

Country/Region of ManufactureGermany

Title_AuthorPradeep George