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Semiconductor Micromachining Vol. 1 Fundamental Electrochemist
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Condition:
Brand New
A new, unread, unused book in perfect condition with no missing or damaged pages.
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US $6.97 (approx S$ 9.02) USPS Media MailTM.
Located in: Yale, Michigan, United States
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Estimated between Tue, 30 Sep and Sat, 4 Oct to 94104
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eBay item number:135500159468
Item specifics
- Condition
- Brand New: A new, unread, unused book in perfect condition with no missing or damaged pages. See all condition definitionsopens in a new window or tab
- Type
- Technology
- Signed
- No
- Narrative Type
- Nonfiction
- Original Language
- English
- Intended Audience
- Adults
- Inscribed
- No
- Country/Region of Manufacture
- Unknown
- ISBN
- 9780471966814
About this product
Product Identifiers
Publisher
Wiley & Sons, Incorporated, John
ISBN-10
0471966819
ISBN-13
9780471966814
eBay Product ID (ePID)
265904
Product Key Features
Book Title
Semiconductor Micromachining, Fundamental Electrochemistry and Physics Vol. 1
Number of Pages
332 Pages
Language
English
Publication Year
1998
Topic
Physics / Electricity, Electronics / Semiconductors
Illustrator
Yes
Genre
Technology & Engineering, Science
Format
Hardcover
Dimensions
Item Height
0.9 in
Item Weight
22 Oz
Item Length
9.3 in
Item Width
6.1 in
Additional Product Features
Intended Audience
Trade
LCCN
97-026052
Dewey Edition
21
Number of Volumes
2 vols.
Volume Number
Volume 1
Dewey Decimal
621.3815/2
Table Of Content
Volume 1 Electrochemical and Photochemical Properties of Semiconductors S. Morrison Chemical and Electrochemical Etching of Semiconductors J. Kelly and D. Vanmaekelbergh Photoetching of III-V Semiconductors: Basic Photoelectrochemical Principles W. Plieth and S. Wetzenstein Influence of Photoelectrochemical Etching on Electronic Properties of Semiconductor Surfaces R. Tenne Surface Conditioning of Silicon by Photoelectrochemical Etching C. Levy-Clement Electrochemical Conditioning of Silicon: Surface Analyses and Electronic Implications H. Lewerenz and H. Jungblut The Formation of Porous Silicon D. Riley Index
Synopsis
Semiconductor Micromachining - Fundamentals and Technology - is a two volume work in which, for the first time, the various disciplines associated with the theory and practice of device fabrication are brought together in one comprehensive reference source. Volume 1 contains a detailed coverage of semiconductor electrochemistry and physics whilst Volume 2 describes the wide range of microengineering technologies with details of practical applications. The authors for each chapter have been carefully selected for their expertise and are acknowledged leaders in their respective fields. The purpose of this book is to enable workers in the area of semiconductor micromachining to have ready access to the basic literature, essential to provide a solid basis for the many different aspects of physics, chemistry, electronics and engineering involved with this technology. The main focus of the book is on structures based on silicon, the most common and versatile of the current range of commercially available semiconductors, but other materials such as III?V semiconductors are also considered. Together these two volumes provide an indispensable reference text for this fast growing area of applied science. It will be of value to a wide range of academic and industrial scientists, technologists and engineers who wish to expand their knowledge in this area of science and for whom thus far, there has been no convenient reference work. Volume 2: Techniques and Industrial Applications, Semiconductor Micromachining - Fundamentals and Technology - is a two volume work in which, for the first time, the various disciplines associated with the theory and practice of device fabrication are brought together in one comprehensive reference source. Volume 1 contains a detailed coverage of semiconductor electrochemistry and physics whilst Volume 2 describes the wide range of microengineering technologies with details of practical applications. The authors for each chapter have been carefully selected for their expertise and are acknowledged leaders in their respective fields. The purpose of this book is to enable workers in the area of semiconductor micromachining to have ready access to the basic literature, essential to provide a solid basis for the many different aspects of physics, chemistry, electronics and engineering involved with this technology. The main focus of the book is on structures based on silicon, the most common and versatile of the current range of commercially available semiconductors, but other materials such as III V semiconductors are also considered. Together these two volumes provide an indispensable reference text for this fast growing area of applied science. It will be of value to a wide range of academic and industrial scientists, technologists and engineers who wish to expand their knowledge in this area of science and for whom thus far, there has been no convenient reference work. Volume 2: Techniques and Industrial Applications, Semiconductor Micromachining - Fundamentals and Technology - is a two volume work in which, for the first time, the various disciplines associated with the theory and practice of device fabrication are brought together in one comprehensive reference source.
LC Classification Number
TK7871.85.S4295 1997
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